The influence of beam divergence on ion-beam induced surface patterns

R. Kree, T. Yasseri, A. K. Hartmann

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

We present a continuum theory and a Monte Carlo model of self-organized surface pattern formation by ion-beam sputtering including effects of beam profiles. Recently, it has turned out that such secondary ion-beam parameters may have a strong influence on the types of emerging patterns. We first discuss several cases, for which beam profiles lead to random parameters in the theory of pattern formation. Subsequently we study the evolution of the averaged height profile in continuum theory and find that the typical Bradley-Harper scenario of dependence of ripple patterns on the angle of incidence can be changed qualitatively. Beam profiles are implemented in Monte Carlo simulations, where we find generic effects on pattern formation. Finally, we demonstrate that realistic beam profiles, taken from experiments, may lead to qualitative changes of surface patterns.

Original languageEnglish
Pages (from-to)1407-1411
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume267
Issue number8-9
DOIs
Publication statusPublished - 1 May 2009

Keywords

  • Beam divergence
  • Continuum theory
  • Ion-beam sputtering
  • Monte Carlo method
  • Pattern formation

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