Surface relief profile of photopolymerisable systems in a single illuminated spot

T. Babeva, D. Mackey, I. Naydenova, S. Martin, V. Toal

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

The formation of surface relief profile in photopolymerisable systems when illuminated with a focused beam of light is simulated numerically using a two-way diffusion model that accounts both for monomer and short polymer chains diffusion. The concentration and spatial distribution dynamics of monomer, short and long polymer chains are calculated. It is assumed that the surface profile is a linear combination of monomer and polymer concentration with appropriate coefficients accounting for polymer shrinkage. A good agreement between the calculated and the experimentally measured profiles is observed thus demonstrating the successful application of the two way diffusion in modeling this system.

Original languageEnglish
Title of host publicationEmerging Trends and Novel Materials in Photonics - International Commission for Optics Topical Meeting, ICO Photonics Delphi 2009
Pages43-46
Number of pages4
DOIs
Publication statusPublished - 2010
EventInternational Commission for Optics (ICO), Topical Meeting on "Emerging Trends and Novel Materials in Photonics", ICO-Photonics-Delphi2009 - Delphi, Greece
Duration: 7 Oct 20099 Oct 2009

Publication series

NameAIP Conference Proceedings
Volume1288
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

ConferenceInternational Commission for Optics (ICO), Topical Meeting on "Emerging Trends and Novel Materials in Photonics", ICO-Photonics-Delphi2009
Country/TerritoryGreece
CityDelphi
Period7/10/099/10/09

Keywords

  • Diffusion
  • Photopolymer
  • Surface relief profile
  • Two-way diffusion model

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