Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher

Vladimir Milosavljević; Niall Macgearailt; P. J. Cullen; Stephen Daniels; Miles M. Turner

doi:10.1063/1.4802440

Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher

Vladimir Milosavljević, Niall Macgearailt, P. J. Cullen, Stephen Daniels, Miles M. Turner

Research output: Contribution to journal › Article › peer-review

Abstract

Phase-resolved optical emission spectroscopy (PROES) is used for the measurement of plasma products in a typical industrial electron cyclotron resonance (ECR) plasma etcher. In this paper, the PROES of oxygen and argon atoms spectral lines are investigated over a wide range of process parameters. The PROES shows a discrimination between the plasma species from gas phase and those which come from the solid phase due to surface etching. The relationship between the micro-wave and radio-frequency generators for plasma creation in the ECR can be better understood by the use of PROES.

Original language	English
Article number	163302
Journal	Journal of Applied Physics
Volume	113
Issue number	16
DOIs	https://doi.org/10.1063/1.4802440
Publication status	Published - 28 Apr 2013

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title = "Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher",

abstract = "Phase-resolved optical emission spectroscopy (PROES) is used for the measurement of plasma products in a typical industrial electron cyclotron resonance (ECR) plasma etcher. In this paper, the PROES of oxygen and argon atoms spectral lines are investigated over a wide range of process parameters. The PROES shows a discrimination between the plasma species from gas phase and those which come from the solid phase due to surface etching. The relationship between the micro-wave and radio-frequency generators for plasma creation in the ECR can be better understood by the use of PROES.",

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AU - Milosavljević, Vladimir

AU - Macgearailt, Niall

AU - Cullen, P. J.

AU - Daniels, Stephen

AU - Turner, Miles M.

PY - 2013/4/28

Y1 - 2013/4/28

N2 - Phase-resolved optical emission spectroscopy (PROES) is used for the measurement of plasma products in a typical industrial electron cyclotron resonance (ECR) plasma etcher. In this paper, the PROES of oxygen and argon atoms spectral lines are investigated over a wide range of process parameters. The PROES shows a discrimination between the plasma species from gas phase and those which come from the solid phase due to surface etching. The relationship between the micro-wave and radio-frequency generators for plasma creation in the ECR can be better understood by the use of PROES.

AB - Phase-resolved optical emission spectroscopy (PROES) is used for the measurement of plasma products in a typical industrial electron cyclotron resonance (ECR) plasma etcher. In this paper, the PROES of oxygen and argon atoms spectral lines are investigated over a wide range of process parameters. The PROES shows a discrimination between the plasma species from gas phase and those which come from the solid phase due to surface etching. The relationship between the micro-wave and radio-frequency generators for plasma creation in the ECR can be better understood by the use of PROES.

UR - https://www.scopus.com/pages/publications/84877313629

U2 - 10.1063/1.4802440

DO - 10.1063/1.4802440

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VL - 113

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 16

M1 - 163302

ER -

Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher

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