Abstract
A study of the light induced surface relief modulation in thin photopolymer layers is reported. Due to the nature of the photopolymer used no additional post-processing is required after holographic recording. An investigation of the dependence of the amplitude of the photoinduced relief modulation on different parameters of recording such as spatial frequency, intensity of the beams and times of exposure has been carried out. The surface relief modulation is characterized by white light interferometry. Photopolymer layer thickness ranges from 1-5μm. A model of the mechanism of surface relief formation is proposed on the basis of the measured dependencies. A variety of patterns are inscribed in order to demonstrate the potential of this photopolymer in the design of different diffractive optical elements.
| Original language | English |
|---|---|
| Article number | 17 |
| Pages (from-to) | 163-172 |
| Number of pages | 10 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 5827 |
| DOIs | |
| Publication status | Published - 2005 |
| Event | Opto-Ireland 2005: Photonic Engineering - Dublin, Ireland Duration: 4 Apr 2005 → 6 Apr 2005 |
Keywords
- Acrylamide
- Holography
- Photoinduced patterns
- Photopolymers
- Surface relief
- Thin films