Direct multiplexing of low order aberration modes in a photopolymer-based holographic element for analog holographic wavefront sensing

The fabrication of an analog holographic wavefront sensor, capable of detecting the low order defocus aberration, was achieved in an acrylamide-based photopolymer. While other implementations of holographic wavefront sensors have been carried out digitally, this process utilises a recording setup consisting only of conventional refractive elements so the cost and complexity of holographic optical element (HOE) production could be much reduced. A pair of diffraction spots, corresponding to a maximum and minimum amount of defocus, were spatially separated in the detector plane by multiplexing two HOEs with different carrier spatial frequencies. For each wavefront with a known aberration that was introduced during playback of the hologram, the resulting intensity ratio was measured in the expected pair of diffracted spots. A number of HOEs were produced with the diffraction efficiency of the multiplexed elements equalized, for a range of diffraction efficiency strengths, some as low as <5%. These HOEs were used to successfully classify four amounts of the defocus aberration through the observed intensity ratio.